Description
1µm x 1µm phase image of pits etched in silicon through the self-assembled diblock, polymer mask. This section represents a small area taken from a 4kx4k scan of the sample. Sample courtesy O. Gang, Brookhaven National Laboratory. Back
1µm x 1µm phase image of pits etched in silicon through the self-assembled diblock, polymer mask. This section represents a small area taken from a 4kx4k scan of the sample. Sample courtesy O. Gang, Brookhaven National Laboratory.
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